Search results
Search for "particle lithography" in Full Text gives 4 result(s) in Beilstein Journal of Nanotechnology.
Charged particle single nanometre manufacturing
Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266
Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning
Beilstein J. Nanotechnol. 2018, 9, 1211–1219, doi:10.3762/bjnano.9.112
- porphyrins and organosilanes. A protocol was developed with particle lithography using steps of immersion in organosilane solutions to selectively passivate the surface of Si(111) with octadecyltrichlorosilane (OTS). A methyl-terminated matrix was chosen to direct the growth of CMPS nanostructures to fill
- matrix of OTS showed minimal areas of nonspecific adsorption. The AFM studies provide insight into the mechanism of the self-polymerization of CMPS as a platform for constructing porphyrin heterostructures. Keywords: atomic force microscopy (AFM); nanostructures; particle lithography; porphyrin; self
- ]. Multiporphyrin assemblies have been proposed for molecular photonic devices due to the versatile physical properties [24]. Particle lithography is a patterning method that uses a surface mask of colloidal spheres to direct the deposition of molecules or other nanomaterials on surfaces. Particle lithography
Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold
Beilstein J. Nanotechnol. 2017, 8, 1863–1877, doi:10.3762/bjnano.8.187
- deposition of robust alkyl thin films on Au surfaces using phthalimide esters as the alkyl radical precursors. In particular, we combine visible-light photosensitization with particle lithography to produce nanostructured thin films, the thickness of which can be measured easily using AFM cursor profiles
- conditions (i.e., with benzyl nicotinamide). We also combined thin film deposition with particle lithography [10][17][45][46][47][48][49]. This approach to surface patterning uses photomasks consisting of silicon dioxide mesospheres (d = 500 nm) on surfaces to protect small, discrete regions of the surface
- cursor profiles and for a head-to-head comparison of the chemical and mechanical stability of a polynitrophenylene multilayer to a thiol thin film on Au(111) [17]. In the work described herein, visible-light-photosensitized deposition of alkyl radicals was combined with particle lithography to generate
Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography
Beilstein J. Nanotechnol. 2012, 3, 114–122, doi:10.3762/bjnano.3.12
- ChaMarra K. Saner Kathie L. Lusker Zorabel M. LeJeune Wilson K. Serem Jayne C. Garno Chemistry Department, Louisiana State University, 232 Choppin Hall, Baton Rouge, LA 70803, USA. Telephone: +1 225 578 8942; Fax: +1 225 578 3458 10.3762/bjnano.3.12 Abstract Particle lithography offers generic
- protocols of particle lithography combined with either vapor deposition, immersion, or contact printing. Changing the physical approaches for applying molecules to masked surfaces produced OTS nanostructures with different shapes and heights. Ring nanostructures, nanodots and uncovered pores of OTS were
- ; nanopatterning; nanostructures; octadecyltrichlorosilane; particle lithography; self-assembled monolayer; self-assembly; Introduction Self-assembled monolayers (SAMs) of organosilanes have become important as surface resists and functional coatings for micro- and nanopatterning applications [1][2][3][4][5][6][7
Other Beilstein-Institut Open Science Activities
